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MEASUREMENT OF TRANSPORT PROPERTIES OF THIN FILMS AND COATINGS

ABSTRACT
Free-standing and substrate-mounted thin films have been widely used for microelectronic and optical devices. In particular, CVD diamond, as a new material with ideal combination of properties (electrical isolator, excellent heat conductor, hardest known material) becomes important both in heat spreading and surface strengthening applications. Thermal barrier coatings are quickly gaining widest application in heat management applications. In devices and systems design, demand for accurate thermophysical property functions of these materials, especially their thermal conductivity and thermal diffusivity, has been increasing. A variety of methods have been applied, modified and developed to measure transport properties of thin films and CVD diamond. Paper reviews methods of measuring thermal conductivity and thermal diffusivity of thin films and CVD diamond and discusses their advantages and disadvantages. Measurements of thermal diffusivity of tantalum, tungsten and nickel thin films at our laboratory applying 4C calorimetric technique are reported.
PAPER SUBMITTED: 1987-12-25
PAPER REVISED: 1998-02-28
PAPER ACCEPTED: 1998-03-09
PUBLISHED ONLINE: 2020-11-07
CITATION EXPORT: view in browser or download as text file
THERMAL SCIENCE YEAR 1997, VOLUME 1, ISSUE Issue 2, PAGES [91 - 106]
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